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Joshua W. Hwang
PATENT ATTORNEY

Education:

George Mason Law School, LLM

Korea University, M.S. Electronic Engineering

 

Korea University, B.S. Electrical Engineering

Admissions:

District of Columbia

USPTO

Mr. Hwang is a Patent Attorney in Kile Park Reed & Houtteman PLLC, having years of experience of preparation and prosecution of patent applications in the technological fields of a System-on-Chip (SoC), semiconductor devices (application processor, DRAM, Fresh Memory, Magnetic RAM), display devices (plasma, OLED, QLED, LDC, and flexible displays), image sensors, battery systems, power management systems, and various digital and analog circuits.

 

Prior to joining Kile Park Reed & Houtteman PLLC, Mr. Hwang worked for 2 years as a patent attorney at H.C. Park & Associates. He worked for 6 years as a patent agent at Lee & Morse PC. He has a solid technical background in semiconductor fields. He was a semiconductor circuit design engineer with Samsung Electronics for 7 years in South Korea with a primary focus in the development of semiconductor chips. He developed various intellectual property (IP) cores in semiconductors, such as temperature sensors embedded in System on Chip (SoC), power management ICs (e.g., Battery Chargers, DC-DC converters, and LDO regulators), ADC, DAC, and PLL. He was as an intern at Harness, Dickey &Pierce, PLC and at Koryo IP & Law.

 

Mr. Hwang received a master’s degree from George mason Law School (Antonin Scalia Law School). He received a master’s degree of Electronic Engineering and a bachelor’s degree of Electrical Engineering from Korea University. He is admitted to the District of Columbia (DC) Bar and registered before the United States Patent and Trademark Office (USPTO).